A. Conde-Gallardo, M. Guerrero, A. B Soto, R. Fragoso, and N. Castillo, “Influence of the carrier gas in the growth kinetics of TiO$_{2}$ films deposited by aerosol assisted chemical vapor deposition with titanium-diisopropoxide as precursor”, Rev. Mex. Fís., vol. 52, no. 5, pp. 459–0, Jan. 2006.