Cobalt nitride films produced by reactive pulsed laser deposition

W. De La Cruz, O. Contreras, G. Soto, E. Perez-Tijerina

Abstract


The nitrides of magnetic metal are becoming important due to their potential technological applications. In this work cobalt nitride thin films are deposited by reactive pulsed laser deposition (nitrogen environments) on silicon substrates at room temperature. The resultant films are characterized in-situ by Auger, X-Ray Photoelectron and Electron Energy Loss Spectroscopies. The chemical bond of the CoN$_{x}$ is strongly linked to the stoichiometry, and it can be controlled by the N background pressure. We conclude that this deposition method offers a means for fine-tuning the properties of cobalt nitride.

Keywords


Cobalt nitride; X-ray photoelectron spectroscopy; electron energy loss spectroscopy; thin films; laser ablation

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REVISTA MEXICANA DE FÍSICA, year 67, issue 2, March-April 2021. Bimonthly Journal published by Sociedad Mexicana de Física, A. C. Departamento de Física, 2º Piso, Facultad de Ciencias, Universidad Nacional Autónoma de México, Ciudad Universitaria, Alcaldía Coyacán, C.P. 04510 , Ciudad de México. Apartado Postal 70-348. Tel. (+52)55-5622-4946, https://rmf.smf.mx/ojs/rmf, e-mail: rmf@ciencias.unam.mx. Chief Editor: José Alejandro Ayala Mercado. INDAUTOR Certificate of Reserve: 04-2019-080216404400-203, ISSN: 2683-2224 (on line), 0035-001X (print), both granted by Instituto Nacional del Derecho de Autor. Responsible for the last update of this issue, Technical Staff of Sociedad Mexicana de Física, A. C., Fís. Efraín Garrido Román, 2º. Piso, Facultad de Ciencias, Universidad Nacional Autónoma de México, Ciudad Universitaria, Alcaldía Coyacán, C.P. 04510 , Ciudad de México. Date of last modification, March 1st., 2021.

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