Calentador de sustratos compacto y de bajo costo para tratamiento térmico in situ de películas delgadas depositadas por rf-sputtering

A. Márquez-Herrera, E. Hernández-Rodríguez, M.P. Cruz-Jáuregui, M. Zapata-Torres, A. Zapata-Navarro

Abstract


In this work we present the design, construction and the evaluation of a low cost substrate heater for working at high vacuum. Its use concentrates in providing in-situ annealing during the growth of thin films under conditions of controlled pressure and corrosive atmosphere. The heater was constructed mainly of stainless steel, ceramic and a resistance of khantal-Al. The body of the heater is cooled using a system of fins and cooling liquid which is isolated completely of the vacuum chamber. The design of the heater also incorporates a rotation system that allows that the substrate turns during the process of growth providing uniformity to the film. Temperature of the substrate is recorded by a type " K" thermocouple which feeds back a temperature controller that provides a modulated voltage to the heating resistance. In order to evaluate the functionality of the heating system, this was mounted in a rf-sputtering equipment and thin films of BaTiO$_{3}$ were grown under different substrate temperatures in an off-axis geometry. The heating system is able to provide an uniform temperature to the substrate as well as to operate by long periods of times.

Keywords


Thin films; annealing; heater system

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Revista Mexicana de Física

ISSN: 2683-2224 (on line), 0035-001X (print)

Bimonthly publication of Sociedad Mexicana de Física, A.C.
Departamento de Física, 2o. Piso, Facultad de Ciencias, UNAM.
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