SnO$_{2}$:F thin films deposited by RF magnetron sputtering: effect of the SnF$_{2}$ amount in the target on the physical properties

F. de Moure-Flores, A. Guillén-Cervantes, K.E. Nieto-Zepeda, J.G. Quiñones-Galván, A. Hernández-Hernández, M. de la L, M. Meléndez-Lira

Abstract


SnO$_{2}$:F thin films were prepared by RF magnetron sputtering onto glass substrates using SnF$_{2}$ as fluorine source. The films were deposited under a mixed argon/hydrogen atmosphere at a substrate temperature of 500$^{\circ}$C. The X-ray diffraction shows that polycrystalline films were grown with a phases mixture of SnO$_{2}$ and SnO. The optical transmittance is between 80 and 90%. The physical properties of the films suggest that SnO$_{2}$ thin films grown with small SnF$_{2}$ content in the target can be considered as candidates for transparent electrodes.

Keywords


F-doped tin oxide; transparent conducting oxide; RF magnetron sputtering; transparent electrodes

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REVISTA MEXICANA DE FÍSICA, year 67, issue 1, January-February 2021. Bimonthly Journal published by Sociedad Mexicana de Física, A. C. Departamento de Física, 2º Piso, Facultad de Ciencias, Universidad Nacional Autónoma de México, Ciudad Universitaria, Alcaldía Coyacán, C.P. 04510 , Ciudad de México. Apartado Postal 70-348. Tel. (+52)55-5622-4946, https://rmf.smf.mx/ojs/rmf, e-mail: rmf@ciencias.unam.mx. Chief Editor: José Alejandro Ayala Mercado. INDAUTOR Certificate of Reserve: 04-2019-080216404400-203, ISSN: 2683-2224 (on line), 0035-001X (print), both granted by Instituto Nacional del Derecho de Autor. Responsible for the last update of this issue, Technical Staff of Sociedad Mexicana de Física, A. C., Fís. Efraín Garrido Román, 2º. Piso, Facultad de Ciencias, Universidad Nacional Autónoma de México, Ciudad Universitaria, Alcaldía Coyacán, C.P. 04510 , Ciudad de México. Date of last modification, January 4, 2021.

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