Estudio de películas amorfas de TiAlN preparadas por erosión catódica reactiva por radiofrecuencias

Abstract

Using the reactive magnetron rf sputtering technique, we prepared TiAlN films with amorphous structure on Corning glass and steel substrates in a reactive atmosphere of nitrogen and argon using a target of Ti-Al (40/60 wt.%). The average temperature of the substrates was about 25$^\circ$C, with the purpose of obtaining amorphous films. The ratio of partial pressure of nitrogen to argon, P$_{N}$/P$_{Ar}$, was varied according to these values: 0.14, 0.28, and 0.43; fixing these values during whole the evaporation. Further on, films were prepared introducing nitrogen in periodic pulses with maximum values of P$_{N}$/P$_{Ar} \approx $ 4.7 during 45 seconds, with fixed periods of 10, 15 and 20 minutes. In all cases amorphous films were obtained, according to X-ray Diffraction. The chemical composition of the samples was measured by electron dispersive spectroscopy, showing a clear dependence with the evaporation conditions. In spite of the amorphous structure of the material, atomic force microscopy measurements showed a surface morphology dependent on the nitrogen content. Additionally, measurements of electronic spectroscopy for chemical analysis and Raman scattering spectroscopy for identification of chemical bonds were carried out. Measurements of mechanical properties of the samples were carried out using nanoindentation and micro-hardness Vicker's tests.