Study of all-pass optical micro-ring resonators using titanium- and zinc oxides on an insulating platform via atomic layer deposition
DOI:
https://doi.org/10.31349/RevMexFis.71.041303Keywords:
High refractive index materials, Atomic layer deposition, Channel waveguide, all-pass optical ring resonator, numerical analysis, finite element methodAbstract
Atomic layer deposition (ALD) is a versatile technique to grow thin films for a wide range of applications including energy conversion and electronics. Materials deposited on insulating platforms through ALD can expand their use in optics and photonics. In this work, we present the design of an integrated optics all-pass micro-ring resonators based on measured optical properties of ALD materials, particularly, titanium- and zinc oxides (TiO2 and ZnO on insulator). For optical communication applications, zinc oxide on an insulator (ZOI) provides mode confinement of 46%, an evanescent decay of 855 nm, and a quality factor of up to 104 at 1550 nm. Atomic layer deposited core materials on an insulator provide an effective alternative for optics and photonics.
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Copyright (c) 2025 J. D. Castro-Toscano, R. Salas-Montiel, D. Jauregui-Vazquez, H. Tiznado, E. G. Lizarraga-Medina, A. G. Navarrete-Alcala, H. Marquez-Becerra
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