Modelo del voltaje de descarga en depósitos de ZrO$_{X}$ por erosión iónica reactiva

Abstract

A Berg model application for ZrO$_{X}$ thin film deposition by DC reactive sputtering is presented. An alternative treatment to this model is proposed, focused on an engineering point of view. Berg model involves target poisoning as a compound covering a fraction of the target surface, pressure, input flow and pumping speed. In the alternative treatment presented, all these quantities --some hard to be measured- are condensed by considering variations in the target voltage and plasma impedance, that together comprises the discharge voltage. The advantage of this handling is that can be easily used by a field engineer, without necessity of advanced knowledge in material science.