Investigation of the anisotropic etching process used for semiconductor pressure sensor fabrication

Authors

  • P. Pe
  • kov.
  • S. Alcántara
  • M. Aceves
  • M. Linares
  • C. Ramírez
  • .
  • R. Galeazzi

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Published

1992-01-01

How to Cite

[1]
P. Pe, kov., S. Alcántara, M. Aceves, M. Linares, C. Ramírez, ., and R. Galeazzi, Investigation of the anisotropic etching process used for semiconductor pressure sensor fabrication, Rev. Mex. Fís. 39, (1992).

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