Growth and characterization of close-spaced vapor transport GaAs layers, using atomic hydrogen as the initial reactant

Authors

  • E. Gómez
  • R. Silva
  • F. Silva-Andrade
  • .
  • J.M. Gracia-Jiménez

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Published

1996-01-01

How to Cite

[1]
E. Gómez, R. Silva, F. Silva-Andrade, ., and J. Gracia-Jiménez, “Growth and characterization of close-spaced vapor transport GaAs layers, using atomic hydrogen as the initial reactant”, Rev. Mex. Fís., vol. 43, no. 5, pp. 785–794, Jan. 1996.

Issue

Vol. 43 No. 5 (1996): Revista Mexicana de Física.

Section

Articles

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Authors retain copyright and grant the Revista Mexicana de Física right of first publication with the work simultaneously licensed under a CC BY-NC-ND 4.0 that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.