Métodos de medición de espesores de películas delgadas basadas en óxidos semiconductores
Keywords:Thin films, Thickness measurement, TiO2, SnO2, ZnO
AbstractTransparent films based on Ti, Sn and Zn oxides are of great importance in electronic devices such as sensors, solar cells and conductive films, then the characterization techniques are highly relevant. The aim of this work is to identify the advantages and disadvantages of direct methods, such as profilometry, and indirect methods such as ellipsometry and spectrophotometry used to quantify film thickness. In this work, films were deposited by spray-pyrolysis on glass substrates at 425±C. Thicknesses varied between 150 and 300 nm. Thicknesses calculated by means of spectrophotometry and ellipsometry, led to differences below 10% and 20 %, respectively, with respect to the value measured
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