Influence of low temperature chlorinated oxides on the stability and generation-recombination properties of MOS structures

Authors

  • P. Pe
  • kov.
  • T. Díaz
  • M. Aceves M.
  • M. Linares A.
  • .
  • W. Calleja A.

Downloads

Download data is not yet available.

Downloads

Published

1988-01-01

How to Cite

[1]
P. Pe, kov., T. Díaz, M. Aceves M., M. Linares A., ., and W. Calleja A., Influence of low temperature chlorinated oxides on the stability and generation-recombination properties of MOS structures, Rev. Mex. Fís. 35, (1988).

Issue

Vol. 35 No. 1 (1988): Revista Mexicana de Física.

Section

Articles

License

Authors retain copyright and grant the Revista Mexicana de Física right of first publication with the work simultaneously licensed under a CC BY-NC-ND 4.0 that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.

Most read articles by the same author(s)

<< < 17 18 19 20 21 22 23 24 25 26 > >>